Research Project Title:
Mechanical Peeling of Epitaxially-Deposited Materials
abstract:Epitaxy, the growth of crystalline material on a substrate, offers a means to produce high-quality semiconductors with molecular-level precision. To date, it has been impossible to separate an epitaxially-deposited layer from the original substrate, without sacrificing the substrate layer. New techniques enable epitaxial growth through an intervening single-molecule layer of graphene, allowing the newly deposited layer to be removed without damage to the underlying substrate. However, to date these methods have entailed peeling the deposited layer from the substrate by hand using thermal tape, reducing the process's consistency and yield. We will try to mechanize this process to allow the process of epitaxial manufacturing to be performed precisely, consistently and automatically.
"I've been lucky enough to be involved in several research projects before at MIT, but in all of them I had a relatively discrete role in a much larger, pre-existing project. I'm excited to have the chance to truly define the scope and aims of the project I'm working on, as well as explore an area of my field haven't gotten the chance to see very much of before."